Deep ultraviolet steppers and scanners for sub-180-nm device fabrication

W. Arnold

Conference on Lasers and Electro-Optics
(Optica Publishing Group, 1998),
paper LTuB3

Deep ultraviolet steppers and scanners for sub-180-nm device fabrication

W. Arnold

Conference on Lasers and Electro-Optics 1998

San Francisco, California United States
3–8 May 1998
ISBN: 1-55752-540-4

From the session
Lithography: II (LTuB)

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W. Arnold, "Deep ultraviolet steppers and scanners for sub-180-nm device fabrication," in Conference on Lasers and Electro-Optics, D. Scifres and A. Weiner, eds., (Optica Publishing Group, 1998), paper LTuB3.

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Abstract

As minimum feature sizes for leading edge-logic and memory integrated circuits shrink to 180 nm and less, stepper manufacturers are pressed to develop optical systems of unprecedented performance and complexity.

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