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  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 1999),
  • paper CWL4

A novel alternating-pump technique for picosecond ultrasonic study of Mo/Si multilayers

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Abstract

Mo/Si multilayer mirror coatings arc a key enabling technology for extreme ultraviolet lithography.

© 1999 Optical Society of America

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