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Optica Publishing Group
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 2000),
  • paper CFB2

A new instrument for measuring low level linear birefringence

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Abstract

Modern optkal instruments, such as semiconductor photolithography equipment, require increasingly low levels of birefringence in lenses, masks and laser windows. Traditional techniques lack the sensitivity required, are cumbersome and time consuming and are not readily adapted for scanning a sample.

© 2000 Optical Society of America

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