Micromachining results using Industrial fluorine lasers at 157 nm

M. Scaggs; E. Mayer; J. Fair; D. Basting

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 2000),
paper CFD2

Micromachining results using Industrial fluorine lasers at 157 nm

M. Scaggs, E. Mayer, J. Fair, and D. Basting

Conference on Lasers and Electro-Optics 2000

San Francisco, California United States
7–11 May 2000
ISBN: 1-55752-634-6

From the session
Laser Micromachining: 1 (CFD)

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
M. Scaggs, E. Mayer, J. Fair, and D. Basting, "Micromachining results using Industrial fluorine lasers at 157 nm," in Conference on Lasers and Electro-Optics, S. Brueck, R. Fields, M. Fejer, and F. Leonberger, eds., OSA Technical Digest (Optica Publishing Group, 2000), paper CFD2.

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Save article

Abstract

Our studies utilized a fluorine laser (Lambda Physik NovaLine F600) with more than 20 mJ/ pulse at 600 Hz. The samples were machined by mask imaging.

PDF Article

More Like This

Detailed study of the upper level of the fluorine laser at 157.5 nm

GREGORY W. FARIS and WILLIAM K. BISCHEL
WDD32 Quantum Electronics and Laser Science Conference (CLEO:FS) 1989

Laser micromachining of transparent glasses and aluminum with ps-pulse bursts at 1054 nm

P. R. Herman, M. Lapczyna, D. Breitling, H. Schittenhelm, H. W. Tan, Y. Kerachian, and R. S. Marjoribanks
CFD3 Conference on Lasers and Electro-Optics (CLEO:S&I) 2000

Processing and grating writing with 157-nm F2 laser radiation

Peter R. Herman, J. David Moore, and K. Beckley
CThD1 Conference on Lasers and Electro-Optics (CLEO:S&I) 1995

Previous Article Next Article