Non-thermal ablation of nitride ceramics with femtosecond Ti:sapphire laser

Hiroyuki Yabe; Yoichi Hirayama; Minora Obara

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 2000),
paper CFK6

Non-thermal ablation of nitride ceramics with femtosecond Ti:sapphire laser

Hiroyuki Yabe, Yoichi Hirayama, and Minora Obara

Conference on Lasers and Electro-Optics 2000

San Francisco, California United States
7–11 May 2000
ISBN: 1-55752-634-6

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Laser Micromachining: 2 (CFK)

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H. Yabe, Y. Hirayama, and M. Obara, "Non-thermal ablation of nitride ceramics with femtosecond Ti:sapphire laser," in Conference on Lasers and Electro-Optics, S. Brueck, R. Fields, M. Fejer, and F. Leonberger, eds., OSA Technical Digest (Optica Publishing Group, 2000), paper CFK6.

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Abstract

The nitride ceramics such as aluminum nitride (AlN), boron nitride (BN), silicon nitride (SiN) have attractive thermal and electrical properties for electronics industry.

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