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Conferences > CLEO > 2000 > CThM > CThM71
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 2000),
  • paper CThM71

Development of a F2 laser with high repetition rate for optical lithography below 100-nm node

S. Nagai, K. Shio, K. Takehisa, J. Fujimoto, O. Wakabayashi, and H. Mizoguchi

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Abstract

The molecular fluorine lasers (F2 lasers) are expected to be applied to optical lithography at design rule below 100 nm for future 4 Gbit dynamic random access memory.1-3

© 2000 Optical Society of America

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