Electric-field-induced second-harmonic generation microscopy

Jesse D. Canterbury; Philip T. Wilson; Michael C. Downer

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 2000),
paper CTuJ1

Electric-field-induced second-harmonic generation microscopy

Jesse D. Canterbury, Philip T. Wilson, and Michael C. Downer

Conference on Lasers and Electro-Optics 2000

San Francisco, California United States
7–11 May 2000
ISBN: 1-55752-634-6

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Applications of Nonlinear Optics: 2 (CTuJ)

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J. D. Canterbury, P. T. Wilson, and M. C. Downer, "Electric-field-induced second-harmonic generation microscopy," in Conference on Lasers and Electro-Optics, S. Brueck, R. Fields, M. Fejer, and F. Leonberger, eds., OSA Technical Digest (Optica Publishing Group, 2000), paper CTuJ1.

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Abstract

Second harmonic generation occurs in semiconducting materials via the second-order polarizability, which is governed by the second- order nonlinear susceptibility tensor χ⁽²⁾.

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