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  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 2001),
  • paper CFC2

Field Emission from Silicon MIcrestructures Formed by Femtosecond Laser Assisted Etching

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Abstract

Field-emission arrays have been extensively investigated for device applications such as flat panel displays, electron multipliers and microelectronics.1,2 The use of silicon structures as emitters is especially attractive due to the low cost and availability of silicon. Previously, our group reported the formation of sharp, micronsized conical structures in quasi-ordered arrays after irradiating a silicon surface with hundreds of femtosecond-laser pulses in an atmosphere of SF6.3,4 Figure 1 shows an SEM image of an array of spikes formed in this manner.

© 2001 Optical Society of America

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