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Conferences > CLEO > 2001 > CThL > CThL8
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 2001),
  • paper CThL8

Experimental and theoretical studies on Mo/Si multilayers for extreme ultraviolet lithography using picosecond ultrasonics

Nen-Wen Pu and Jeffrey Bokor

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Abstract

Mo/Si multilayer mirror coatings arc a key enabling technology for extreme ultraviolet (EUV) lithography, a promising next-generation tool for the mass production of integrated circuits with design rules below 0.1 µm.1

© 2001 Optical Society of America

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