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  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 2001),
  • paper CTuM30

Optimization of sidewall roughness in silica waveguides to reduce the propagation losses

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Abstract

The propagation loss of silica waveguide is mainly due to the non-uniformities arising from the film deposition and etching process.

© 2001 Optical Society of America

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