Photothermal Deflection for Microscopy and Detection of Submicron-sized Defects

Annelise During; Caroline Fossati; Mireille Commandré

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 2002),
paper CTuK29

Photothermal Deflection for Microscopy and Detection of Submicron-sized Defects

Annelise During, Caroline Fossati, and Mireille Commandré

Conference on Lasers and Electro-Optics 2002

Long Beach, California United States
19–22 May 2002
ISBN: 1-55752-706-7

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Poster Session: 1 (CTuK)

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A. During, C. Fossati, and M. Commandré, "Photothermal Deflection for Microscopy and Detection of Submicron-sized Defects," in Conference on Lasers and Electro-Optics, M. Fejer, F. Leonberger, J. Fujimoto, and S. Newton, eds., OSA Technical Digest (Optica Publishing Group, 2002), paper CTuK29.

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Abstract

Photothermal deflection is widely used to study lowly absorbing defects in optical coatings and the role of these defects in laser damage.^1,2 High lateral spatial resolution and high sensitivity are required to detect defects as small as possible.^3,4

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