Super-Resolution by Nonlinear Optical Lithography

Sean J. Bentley; Robert W. Boyd

Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference
Technical Digest (Optica Publishing Group, 2003),
paper CMH4

Super-Resolution by Nonlinear Optical Lithography

Sean J. Bentley and Robert W. Boyd

Conference on Lasers and Electro-Optics 2003

Baltimore, Maryland United States
1–6 June 2003
ISBN: 1-55752-733-4

From the session
Novel Applications of NLO (CMH)

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S. J. Bentley and R. W. Boyd, "Super-Resolution by Nonlinear Optical Lithography," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference, Technical Digest (Optica Publishing Group, 2003), paper CMH4.

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Abstract

A method for improving the resolution of a lithographic system by an arbitrary amount (with no visibility reduction for incoherent mask methods) is proposed and demonstrated experimentally. The method simply relies on the sharpened features available through N-photon detection.

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