Abstract
A new method of patterning photonic crystal (PhC) structures by single-spot electron-beam exposure scheme is presented. An order-of-magnitude reduction in the required job time compared to that for the conventional multi-spot scheme has been achieved.
© 2003 Optical Society of America
PDF ArticleMore Like This
Yongchun Zhong and Kam Sing Wong
JTuA113 Conference on Lasers and Electro-Optics (CLEO:S&I) 2007
Brian Bilenberg, Lars Hagedorn Frandsen, Theodor Nielsen, Marko Vogler, Peter Ingo Borel, and Anders Kristensen
CTuK2 Conference on Lasers and Electro-Optics (CLEO:S&I) 2006
S. Klengel, P. Caillaud, R. F. Oulton, P. N. Stavrinou, G. Parry, J. Heffernan, and B. Poole
CWA9 Conference on Lasers and Electro-Optics (CLEO:S&I) 2003