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Conferences > CLEO > 2005 > JTuC > JTuC44
  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science and Photonic Applications Systems Technologies
  • Technical Digest (CD) (Optica Publishing Group, 2005),
  • paper JTuC44

Femtosecond Laser Ablation of Silicon (100) with Thermal Oxide Thin Films of Varying Thickness

Joel P. McDonald, Katherine E. Ray, Vanita R. Mistry, Gérard Mourou, and Steven M. Yalisove

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Abstract

Femtosecond laser ablation of Silicon (100) with thermal oxide thin films was studied in order to further understand the ablative properties of thin films and to evaluate their influence on the ablation of the substrate.

© 2005 Optical Society of America

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