Abstract
Sub-micron patterning of silicon is demonstrated by direct femtosecond laser ablation. An enhancement of the ablation rate and a reduction of debris formation are achieved by covering the surface with a PMMA layer prior to ablation.
© 2006 Optical Society of America
PDF ArticleMore Like This
Shane M. Eaton, Carmela De Marco, Stefano Rampini, Giulio Cerullo, Roberta Ramponi, Stefano Turri, Marinella Levi, and Roberto Osellame
CWE2 CLEO: Science and Innovations (CLEO:S&I) 2011
Samuel S. Mao
CMHH1 Conference on Lasers and Electro-Optics (CLEO:S&I) 2006
Juqiang Fang and Qiang Cao
FW4A.6 Frontiers in Optics (FiO) 2014