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Conferences > CLEO > 2006 > CTuB > CTuB2
  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
  • Technical Digest (CD) (Optica Publishing Group, 2006),
  • paper CTuB2

Three-Dimensional femtosecond photochemical etching in silicon

Yujun Deng, Huimin Ouyang, Philippe M. Fauchet, and Wayne H. Knox

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Abstract

Micron-size channels have been made inside silicon by femtosecond laser-assisted HF etching. The etching is guided by localized carriers generated via two-photon absorption. Its potential of 3-D drilling has been demonstrated.

© 2006 Optical Society of America

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