Numerical Model of the Optical Stark effect as a Mode-Locking Mechanism for Femtosecond Vertical-External-Cavity Surface-Emitting Semiconductor Lasers

G. J. Daniell; Z. Mihoubi; K.G. Wilcox; A. C. Tropper

Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
OSA Technical Digest (CD) (Optica Publishing Group, 2008),
paper CThF3

Numerical Model of the Optical Stark effect as a Mode-Locking Mechanism for Femtosecond Vertical-External-Cavity Surface-Emitting Semiconductor Lasers

G. J. Daniell, Z. Mihoubi, K.G. Wilcox, and A. C. Tropper

Conference on Lasers and Electro-Optics 2008

San Jose, California United States
4–9 May 2008
ISBN: 978-1-55752-859-9

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Mode-Locked Semiconductor Lasers I (CThF)

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G. J. Daniell, Z. Mihoubi, K. G. Wilcox, and A. C. Tropper, "Numerical Model of the Optical Stark effect as a Mode-Locking Mechanism for Femtosecond Vertical-External-Cavity Surface-Emitting Semiconductor Lasers," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, OSA Technical Digest (CD) (Optica Publishing Group, 2008), paper CThF3.

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Abstract

A pulse is shortened by repeated transits of a quantum well absorber in which the band-edge is detuned to higher energy. The calculated effect is consistent with the experimentally observed formation of 448-fs transform-limited pulses.

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