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Conferences > CLEO > 2009 > CMQQ > CMQQ5
  • Conference on Lasers and Electro-Optics/International Quantum Electronics Conference
  • OSA Technical Digest (CD) (Optica Publishing Group, 2009),
  • paper CMQQ5
  • •https://doi.org/10.1364/CLEO.2009.CMQQ5

Fabrication of antireflection nanostructures on GaAs by holographic lithography for device applications

Y. M. Song, S. Y. Bae, J. S. Yu, and Y. T. Lee

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Abstract

We demonstrate the fabrication of antireflection nanostructures on GaAs using holographic lithography. Measured results of the fabricated nanostructures are in good agreement with the calculated values using a RCWA model, effectively suppressing the surface reflection over visible and near-infrared ranges.

© 2009 Optical Society of America

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