Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > CLEO > 2009 > JWA > JWA114
  • Conference on Lasers and Electro-Optics/International Quantum Electronics Conference
  • OSA Technical Digest (CD) (Optica Publishing Group, 2009),
  • paper JWA114
  • •https://doi.org/10.1364/CLEO.2009.JWA114

High Aspect ratio metamaterials for enhanced tunability and sensitivity

Sher-Yi Chiam, Mohammed Bahou, Herbert O Moser, Jianqiang Gu, Ranjan Singh, Weili Zhang, Jiaguang Han, and Andrew A. Bettiol

Not Accessible

Your library or personal account may give you access

Abstract

Using a proton beam based lithography process, we fabricate and study high aspect ratio metamaterials, revealing distinct 3-dimensional resonances. Increased aspect ratio also leads to enhanced tunability and sensitivity for practical applications.

© 2009 Optical Society of America

PDF Article
More Like This
Fabrication of High Aspect Ratio Optical Light Pipes

Winnie N. Ye, Peter Duane, Munib Wober, and Kenneth B. Crozier
FTuV2 Frontiers in Optics (FiO) 2009

Doping-Tunable Metamaterials in the Mid-Infrared

Xiaoyu Miao, Brandon Passmore, Aaron Gin, Shivashankar Vangala, William Goodhue, Eric Shaner, and Igal Brener
PDPB8 Frontiers in Optics (FiO) 2009

Femtosecond micromachining of high aspect ratio structures in fused silica using Bessel beams

M. K. Bhuyan, F. Courvoisier, P.-A. Lacourt, M. Jacquot, L. Furfaro, M. J. Withford, and J. M. Dudley
CM3_5 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2009

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use