Comparison of plasma-effect in different InP-based VCSELs

A. Hangauer; A. Hangauer; J. Chen; J. Chen; M.-C. Amann

doi:10.1364/CLEO.2010.CMO4

Conference on Lasers and Electro-Optics 2010
OSA Technical Digest (CD) (Optica Publishing Group, 2010),
paper CMO4
•https://doi.org/10.1364/CLEO.2010.CMO4

Comparison of plasma-effect in different InP-based VCSELs

A. Hangauer, J. Chen, and M.-C. Amann

Conference on Lasers and Electro-Optics 2010

San Jose, California United States
16–21 May 2010
ISBN: 978-1-55752-889-6

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VCSEL II (CMO)

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A. Hangauer, J. Chen, and M. -. Amann, "Comparison of plasma-effect in different InP-based VCSELs," in Conference on Lasers and Electro-Optics 2010, OSA Technical Digest (CD) (Optica Publishing Group, 2010), paper CMO4.

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Abstract

The FM amplitude/phase responses of InP-based VCSELs at 1.5µm, 1.8µm and 2.3µm are presented and compared. The plasma effect is clearly observed although at 2.3µm it is significantly lower. This interesting result is discussed.

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