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Fabrication of Photonic Crystals with Sub-100 nm Features using Multiphoton Lithography with Pre-swollen Resins

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Abstract

Pre-swelling of resins has allowed the fabrication of photonic crystals with linewidths below 100 nm using multiphoton lithography at 730 nm. The resulting polymer photonic crystals show stop-band reflectivities over 70% at ~1.8 μm.

© 2010 Optical Society of America

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