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Reducing Si Reflectance by Improving Density and Uniformity of Si Nanowires Fabricated by Metal-Assisted Etching

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Abstract

A silicon surface treatment before metal-assisted etching increases the density of silicon nanowires. The improvement reduces the solar-weighted reflectance to as low as 3.3% for silicon nanowires with a length of only 0.87μm.

© 2010 Optical Society of America

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