Sub-Wavelength Structure for Anti-Reflection Fabricated by Fast Atom Beam Etching

Kazuhiro Hane; Yoshiaki Kanamori

The 4th Pacific Rim Conference on Lasers and Electro-Optics
Technical Digest Series (Optica Publishing Group, 2001),
paper MH1_5

Sub-Wavelength Structure for Anti-Reflection Fabricated by Fast Atom Beam Etching

Kazuhiro Hane and Yoshiaki Kanamori

Conference on Lasers and Electro-Optics/Pacific Rim 2001

Chiba Japan
15–19 July 2001
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Nanostructure [Room H] (MH1)

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K. Hane and Y. Kanamori, "Sub-Wavelength Structure for Anti-Reflection Fabricated by Fast Atom Beam Etching," in The 4th Pacific Rim Conference on Lasers and Electro-Optics, Technical Digest Series (Optica Publishing Group, 2001), paper MH1_5.

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Abstract

We fabricated two-dimensional subwavelength structured (SWS) surfaces on crystal silicon (Si) and gallium aluminum arsenide (GaAlAs) substrates. The SWS surfaces had 150-200 nm period tapered gratings. In visible wavelength, the reflectivities decreased drastically on the SWS surfaces.

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