Abstract

Deep-UV laser sources, particularly those operating at a wavelength of 193 nm, have been in great demand for use in micro-lithographic applications, medical applications, and many other applications that require high photon energy. In addition to the ArF excimer laser, several different solid-state 193 nm laser systems have been demonstrated.^[1] Most of these systems, however, are based on the Q-switched laser and/or tunable lasers, and require complex laser setups. By contrast, UV sources based on fiber lasers and amplifiers are compact and have robust characteristics.

© 2001 IEEE