Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • Conference on Lasers and Electro-Optics/Pacific Rim 2007
  • (Optica Publishing Group, 2007),
  • paper TuA3_2

High Average Power and High Repetition Solid State Laser for EUV Lithography

Not Accessible

Your library or personal account may give you access


We have been developing a high repetition (5 kHz) and high power (5 kW) Nd: YAG laser system pumped by cw LDs for EUV lithography. Design concepts and experimental results will be reported.

© 2007 IEEE

PDF Article
More Like This
High Repetition and High Average Power Solid-State Laser for EUV Lithography

H. Fujita, K. Tsubakimoto, H. Yoshida, R. Bhushan, N. Miyanaga, and M. Nakatsuka
CA5_2 The European Conference on Lasers and Electro-Optics (CLEO_Europe) 2009

High Repetition and High Average Power Nd:YAG Laser for EUV Lithography

Hisanori Fujita, Masahiro Nakatsuka, Ravi Bhushan, Koji Tsubakimoto, Hidetsugu Yoshida, Noriaki Miyanaga, and Yasukazu Izawa
WE37 Advanced Solid-State Photonics (ASSP) 2008

High-Power, High-Repetition-Rate Pulsed CO2 Lasers and their application in EUV lithography sources

Yezheng Tao, Alex Schafgans, Slava Rokitski, Michael Kats, Jayson Stewart, Jonathan Grava, Palash Das, Lukasz Urbanski, Mike Purvis, Mike Vargas, Spencer Rich, Mathew Abraham, Phil Conklin, Rob Rafac, Rick Sandstrom, Igor Fomenkov, David Brandt, and Daniel Brown
AM2K.4 CLEO: Applications and Technology (CLEO_AT) 2016

Select as filters

Select Topics Cancel
© Copyright 2022 | Optica Publishing Group. All Rights Reserved