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Conferences > CLEOPR > 2009 > TUP > TUP2_12
  • Conference on Lasers and Electro-Optics/Pacific Rim 2009
  • (Optica Publishing Group, 2009),
  • paper TUP2_12

Odd aberration measurement of projection optics in lithographic tools based on dipole illumination

Bo Peng, Xiangzhao Wang, Zicheng Qiu, and Qiongyan Yuan

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Abstract

Theoretical analysis of impact of illumination profile on measurement accuracy is given. A novel measurement technique using Alt-PSM marks under dipole illumination is proposed based on the analysis result.

© 2009 IEEE

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