Nanolithography using Micro-scale mask Enabled by Hyperbolic Metamaterial

Donghwan Kim; Yong Rae Cho; Bumki Min

2015 Conference on Lasers and Electro-Optics Pacific Rim
(Optica Publishing Group, 2015),
paper 27P_47

Nanolithography using Micro-scale mask Enabled by Hyperbolic Metamaterial

Donghwan Kim, Yong Rae Cho, and Bumki Min

Conference on Lasers and Electro-Optics/Pacific Rim 2015

Busan Republic of Korea
24–28 August 2015
ISBN: 978-1-4673-7110-0

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Poster Session 3 (27P)

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D. Kim, Y. R. Cho, and B. Min, "Nanolithography using Micro-scale mask Enabled by Hyperbolic Metamaterial," in 2015 Conference on Lasers and Electro-Optics Pacific Rim, (Optica Publishing Group, 2015), paper 27P_47.

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Abstract

We newly developed a nano-scale patterning method overcoming the diffraction limit of conventional photolithography technique by utilizing micro-scale aluminum mask-hyperbolic metamaterials hybrid structures, which is supported by our numerical simulation and experimental results.

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