Abstract
The surface roughening and crack generation during the HVPE growth on the MOVPE-grown semipolar GaN template were successfully suppressed by using SiO2 striped masks perpendicular to the a-axis on the semipolar GaN template. The growth toward the –c-direction during the MOVPE growth was also successfully suppressed by using the growth temperature control; this resulted in a large reduction in the formation of stacking faults in semipolar GaN.
© 2015 IEEE
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