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Optica Publishing Group
  • 2017 Conference on Lasers and Electro-Optics Pacific Rim
  • (Optica Publishing Group, 2017),
  • paper s1073

Superior Wafer-scale Uniformity in a Laser Interference Lithography System Equipped with a Refractive Beam Shaper

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Abstract

Wafer-scale nanopatterning of hexagonal two- dimensional gratings is demonstrated by utilizing a Lloyd’s mirror interferometer with a top-hat light field. The variation in fill factor and ellipticity of as-realized gratings is only 2.5% and 0.06, respectively, over the entire two-inch silicon wafer.

© 2017 Optical Society of America

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