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Conferences > CLEOPR > 2022 > CWP19B > CWP19B_01

XFEL single-nanometer focusing system at SACLA

Jumpei Yamada, Satoshi Matsuyama, Takato Inoue, Atsuki Ito, Ichiro Inoue, Taito Osaka, Yuichi Inubushi, Hirokatsu Yumoto, Takahisa Koyama, Haruhiko Ohashi, Kazuto Yamauchi, and Makina Yabashi

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Abstract

A sub-10 nm focusing mirror system for the XFEL has been developed to generate an ultra-intense X-ray laser field. For the sub-10 nm focusing optic, an advanced Kirkpatrick- Baez mirror system based on Wolter-type III geometry has been adopted. The mirrors were fabricated based on a strategy of X-ray wavefront correction. As the results of the performance test at SACLA, we confirmed nearly diffraction-limited wavefront accuracy, 7 nm focusing spot size, more than 10 hours stability, and ~1022 W/cm2 intensity.

© 2022 IEEE

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