Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

EUV/X-ray Multilayer Optics: Meeting the Challenges of Next-Generation Applications

Not Accessible

Your library or personal account may give you access

Abstract

This paper summarizes recent advances in the development of EUV/x-ray multilayer optics for photolithography, free-electron and tabletop lasers, and solar physics. Driven by the needs of their respective applications, the optics meet a variety of extraordinary specifications including coating thickness control in the picometer (rms) range, low coating stress, resistance to atmospheric corrosion, while at the same time maintaining high reflective performance.

© 2016 Optical Society of America

PDF Article
More Like This
Spontaneously intermixed Al-Mg coatings as efficient corrosion barriers in Mg/SiC multilayers

Regina Soufli, Mónica Fernández-Perea, Jeff C. Robinson, Sherry L. Baker, Jennifer Alameda, Christopher C. Walton, Luis Rodríguez-De Marcos, Jose A. Méndez, Juan I. Larruquert, and Eric M. Gullikson
MD.1 Optical Interference Coatings (OIC) 2013

Recent advances in Cr-based interference coatings for EUV and soft x-ray optics

F. Delmotte, C. Burcklen, E. Meltchakov, R. Soufli, J. Rebellato, A. Jérome, and S. de Rossi
FB.1 Optical Interference Coatings (OIC) 2019

EUV and soft X-ray multilayer coatings

Norbert Kaiser, Sergiy Yulin, and Torsten Feigl
WF10 Optical Interference Coatings (OIC) 2004

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved