Abstract
This paper summarizes recent advances in the development of EUV/x-ray multilayer optics for photolithography, free-electron and tabletop lasers, and solar physics. Driven by the needs of their respective applications, the optics meet a variety of extraordinary specifications including coating thickness control in the picometer (rms) range, low coating stress, resistance to atmospheric corrosion, while at the same time maintaining high reflective performance.
© 2016 Optical Society of America
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