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High-Power, High-Repetition-Rate Pulsed CO2 Lasers and their application in EUV lithography sources

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Abstract

Cymer-ASML is committed to develop high power EUV source technology based on CO2 laser-produced-plasma (LPP) for use in EUV lithography for high-volume-manufacturing of semiconductors. Stable dose controlled EUV power at intermediate focus (IF) has been successfully developed using a CO2 laser of high intensity, short pulse duration, high repetition, and high average power. Figure 1 shows 185 W at Intermediate Focus (IF) dose-controlled EUV source power and dose stability over a one hour demonstration. EUV pulse energy up to 5 mJ with 22% overhead is created at 50 kHz. Dose error is all smaller than 1%. This enables 100% good dies exposure.

© 2016 Optical Society of America

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