A Laboratory Light Source for Ultrafast Kinetics of EUV Exposure Processes and Ultra-Small Pitch Lithography

Seth L. Cousin; Clayton Bargsten; Eric Rinard; Rod Ward; Erik Hosler; Brennan Petersen; Henity Kapteyn; Henity Kapteyn; Pieter Vanelderen; John Petersen; Paul van der Heide

doi:10.1364/CLEO_AT.2020.ATh1K.5

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 2020),
paper ATh1K.5
•https://doi.org/10.1364/CLEO_AT.2020.ATh1K.5

A Laboratory Light Source for Ultrafast Kinetics of EUV Exposure Processes and Ultra-Small Pitch Lithography

Seth L. Cousin, Clayton Bargsten, Eric Rinard, Rod Ward, Erik Hosler, Brennan Petersen, Henity Kapteyn, Pieter Vanelderen, John Petersen, and Paul van der Heide

CLEO: Applications and Technology 2020

Washington, DC United States
10–15 May 2020
ISBN: 978-1-943580-76-7

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High Brightness and Ultrafast Lasers and Systems (ATh1K)

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S. L. Cousin, C. Bargsten, E. Rinard, R. Ward, E. Hosler, B. Petersen, H. Kapteyn, P. Vanelderen, J. Petersen, and P. van der Heide, "A Laboratory Light Source for Ultrafast Kinetics of EUV Exposure Processes and Ultra-Small Pitch Lithography," in Conference on Lasers and Electro-Optics, OSA Technical Digest (Optica Publishing Group, 2020), paper ATh1K.5.

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Abstract

An ultra-short pulsed, ultra-broadband (~13nm-~13pm) light-source has been developed to drive atto- to femto- second time-resolved studies on EUV photo-resist materials. The same source will also be used to investigate EUV driven nano-lithography.

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