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Monolithically Integrated Extended Cavity Diode Laser emitting at 778 nm

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Abstract

We present a monolithically integrated extended cavity diode laser at 778 nm with a 3 dB linewidth of 200 kHz @ 1 ms. This is the first successful demonstration of active layer removal in AlGaAs by a 2-step epitaxy manufacturing process.

© 2022 The Author(s)

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