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Simulation Framework of Laser Produced Tin Plasma Extreme Ultraviolet Light Emission Based on Quasi-Steady State Approach of Plasma Radiative Property

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Abstract

Enhancement of EUV emission from laser-produced plasma is a crucial issue for semiconductor manufacturing. One-dimensional simulation framework is developed with quasi-equilibrium assumption, which saves computational cost and has qualitative agreement with experiments.

© 2023 The Author(s)

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