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Conferences > CLEO_AT > 2023 > JW2A > JW2A.66

Triple-Etch Grating for Near Perfect Coupling at Normal Incidence

Carson G. Valdez, Sunil Pai, Payton Broaddus, and Olav Solgaard

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Abstract

We numerically demonstrate a grating coupler design with a peak efficiency of 96%(−0.18dB) at normal incidence on standard Silicon-On-Insulator. This design takes into account fabrication constraints suitable for E-beam lithography and can be realized through three consequtive etch steps.

© 2023 The Author(s)

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