Abstract
The process technology, which has been called "radiplanar," allows us to improve integrated circuit performance in various points of view. The radiplanar process’ includes two supplementary operations that are not used in usual IS process flow.2 The first one calls for MeV-energy electron irradiation with high dose. The second step comprises a pulsed laser annealing. The additional technological operations are quite compatible with standard process flow and would demand only some minor changes in a few of the standard technological operations for fabricating semiconductors.
© 1994 IEEE
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