The near-field far-field transition in interferometric microscopy: Implications for superresolution approaches

M. Totzeck; H.J. Tiziani

doi:10.1364/CLEO_EUROPE.1996.CMI1

Conference on Lasers and Electro-Optics Europe
Technical Digest Series (Optica Publishing Group, 1996),
paper CMI1
•https://doi.org/10.1364/CLEO_EUROPE.1996.CMI1

The near-field far-field transition in interferometric microscopy: Implications for superresolution approaches

M. Totzeck and H.J. Tiziani

The European Conference on Lasers and Electro-Optics 1996

Hamburg Germany
8–13 September 1996
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Microscope Measurement Techniques (CMI)

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M. Totzeck and H. J. Tiziani, "The near-field far-field transition in interferometric microscopy: Implications for superresolution approaches," in Conference on Lasers and Electro-Optics Europe, Technical Digest Series (Optica Publishing Group, 1996), paper CMI1.

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Abstract

A modified moment-method was developed for the rigorous calculation of 2D-electromagnetic near-fields of arbitrary structures in a stratified medium for obliquely incident, plane waves. These near fields serve as starting point for the calculation of the resulting images according to conventional bright- or darkfield, interferometric or confocal scanning microscopy (Fig. 1).

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