Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • CLEO/Europe and IQEC 2007 Conference Digest
  • (Optica Publishing Group, 2007),
  • paper CK_25

Sidewall Roughness Measurement of Photonic Wires and Photonic Crystals

Not Accessible

Your library or personal account may give you access

Abstract

The performance of nanophotonic building blocks such as photonic wires and photonic crystals are rapidly improving, with very low propagation loss and very high cavity Q-factors being reported [1]. In order to facilitate further improvements in performance the ability to quantitatively measure topological imperfections such as sidewall roughness on a sub-nm scale becomes essential [2]. In this paper we use atomic force microscopy (AFM) on tilted samples to obtain the most detailed sidewall roughness measurements yet on nanophotonic structures.

© 2007 IEEE

PDF Article
More Like This
Sidewall Roughness in Si3N4 Waveguides Directly Measured by Atomic Force Microscopy

Samantha P. Roberts, Xingchen Ji, Jaime Cardenas, Alex Bryant, and Michal Lipson
SM3K.6 CLEO: Science and Innovations (CLEO:S&I) 2017

3D AFM Characterization of the Edge Roughness of Silicon High Q Resonators

P. Schiavone, M. Martin, P. Alipour, A. Eftekhar, S. Yegnanarayanan, and A. Adibi
JThE32 Conference on Lasers and Electro-Optics (CLEO:S&I) 2010

Impact of Sidewall Roughness on Integrated Bragg Gratings

Alexandre D. Simard, Nicolas Ayotte, Yves Painchaud, and Sophie LaRochelle
JTuI23 CLEO: Applications and Technology (CLEO:A&T) 2011

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved