Abstract
Femtosecond laser induced breakdown of dielectric thin films has gained a great deal of interest in fundamental as well as in applied science since it probes matter far from thermal equilibrium, for its importance in laser nano- and micromachining and in the development of optical coatings for the next generation of high-power ultrafast laser systems. Experimental and theoretical studies of oxide films suggested a scaling law for the breakdown threshold fluence F with respect to the material’s band gap Eg and pulse duration τ according to
© 2007 IEEE
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