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  • CLEO/Europe and EQEC 2009 Conference Digest
  • (Optica Publishing Group, 2009),
  • paper CH5_1

Structural and Chemical Surface Analysis with EUV/XUV Radiation Using a Broadband Laser Plasma Source and Optics System

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Abstract

Triggered by the roadmap of the semiconductor industry, tremendous progress has been achieved in the development of Extreme Ultraviolet (EUV) sources and high-quality EUV optical coatings in recent years, opening up also new fields of applications apart from microlithography, such as metrology, high-resolution microscopy, or surface analysis.

© 2009 IEEE

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