Abstract
Amorphous hydrogenated Si (a-Si:H) thin-film solar cells offer power conversion efficiencies up to 12% and use the advantage of the existing infrastructure of Si industry, therefore they are of high technologic interest. Moreover, amorphous Si is cost-effective compared to crystalline Si and it is only needed in small quantities for thin-film solar cell production on rigid or flexible substrates. Pulsed laser deposition (PLD) is a simple, versatile, and cost-effective technique [1] for the deposition of a-Si:H layers.
© 2013 IEEE
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