Abstract
Graphene nanopatterning has a very wide range of applications for next generation technology: photonics, displays and solar energy [1]. Femtosecond laser ablation is extremely advantageous for large scale patterning because it is a fast reconfigurable, high throughput, processing technology useable on non-flat surfaces. Previous studies of fs-laser ablation patterning in accumulative thermal regime (burning) have shown high accuracy (down to <100 nm) but it is a slow process [2]. Single shot femtosecond pulse ablation experiments were recently carried out on graphene but only at scales larger than typ. 1µm [3,4]. To decrease the range of processed size, accurate measurement of ablation threshold was needed.
© 2015 IEEE
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