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Conferences > CLEO_Europe > 2015 > CM_P > CM_P_17
  • 2015 European Conference on Lasers and Electro-Optics - European Quantum Electronics Conference
  • (Optica Publishing Group, 2015),
  • paper CM_P_17

Multi-Shot Laser Ablation and Digital Micromirror Device Mask Translation for Sub-diffraction-limit Machining Resolution

D. J. Heath, B. Mills, J. A. Grant-Jacob, M. Feinaeugle, and R. W. Eason

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Abstract

Digital Micromirror Devices (DMDs) can offer rapidly generated, bespoke intensity modulation masks for image-projection-based laser-machining. Recent work has shown repeatable sub-micron feature patterning [1], with proposed applications in the medical sciences and photonics. While DMDs can offer rapid patterning, with ~32kHz switching speeds available [2], they are not yet efficient reflectors at <300nm, thus limiting machining resolution to the diffraction limit at the near-visible wavelengths and above.

© 2015 IEEE

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