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  • 2017 European Conference on Lasers and Electro-Optics and European Quantum Electronics Conference
  • (Optica Publishing Group, 2017),
  • paper CE_P_28

The Optical Resiliency of Direct Laser Writing 3D Nanolithography Produced Microstructures to Intense Irradiation

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Abstract

The need for microoptical elements in various emerging fields such as astrophotonics, nonlinear optics and biomedicine create a demand for a new generation optics that would be lightweight/compact, resilient to harsh environment and easily integrable in other devices. Ultrafast pulses based direct laser writing 3D nanolithography produced microlenses seem as one of the candidates for such applications due to true 3D nanostructuring ability on virtually any substrate [1, 2]. However, before it could become widespread solution, several important questions about the properties of such microoptical elements have to be answered. One of them is what is the transparency and optical damage threshold of laser nanolithography made 3D components?

© 2017 IEEE

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