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Optica Publishing Group
  • 2017 European Conference on Lasers and Electro-Optics and European Quantum Electronics Conference
  • (Optica Publishing Group, 2017),
  • paper CJ_8_2

Deep-UV plasma emission in hollow-core photonic crystal fiber using gas mixture

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Abstract

Atomic or molecular plasmas are an excellent media to produce a fluorescence light source emitting in the UV spectral range, which is of interest for many applications in biological, physical, chemical and other fields such as water decontamination, spectrophotometry, and photolithography. In parallel, the emergent hollow-core photonic crystal fiber (HC-PCF) technology has demonstrated its ability in micro-confining light and gases together [1]. Recently, this confinement has been extended to ionized gas with an Argon plasma that has been successfully generated inside the core of an inhibited-coupling (IC) HC-PCF with no damage to the fiber structural integrity [2]. This result opened an original platform ideal to realize very compact photonic components for DUV/UV laser systems. In this context, we report here on a broad DUV/UV emission using microwave-driven plasma-core PCF for development of such a tunable and miniaturized UV radiation source. By using a ternary gas mixture of argon, oxygen and nitrogen (Ar/O2/N2) with an adjustable gas ratio, we generated a stable micro-plasma column in IC Kagome HC-PCF over few cm length and demonstrated the emission of several fluorescence and guided lines in the 200-450 nm wavelength range. The optimum ratio of ternary gas mixture components for strongest emission in the DUV domain has been identified through systematic spectroscopic measurement campaign in HC-PCF. Figure 1 shows the transmitted spectra obtained at the output of a 19-cell core defect Kagomé HC-PCF (corresponding to 117 μm-core diameter) for various gas mixture ratios at a fixed microwave power of 35 W and a gas pressure of few mbar. Gradually, as we introduce the N2 and the O2 components (Fig.1 (b) to (e)) to the Ar, several new lines appear due to the interaction of each molecule in the plasma ignition gas medium. From 275 nm up to 400 nm, one can observe the classical band emission of Nitrogen molecule from the Second Positive System. Then, the emission from 200 to 275 nm is assigned to the band emission of the NOγ system. From these results, the ternary gas mixture ratio of 90%-5%-5% is found the optimum to demonstrate the broadest emission in the DUV/UV. A simulation study was also performed in such a gas mixture, using a 0D-global model, to determine the influence of the electron density on the radiation emission [3]. In Fig. 2 the theoretical evolution of the different spectral lines intensity of the Ar-O2-N2 plasma for both gas mixtures are plotted. The result shows a good agreement with experimental ones.

© 2017 IEEE

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