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Conferences > CLEO_Europe > 2021 > cm_2 > cm_2_2
  • 2021 Conference on Lasers and Electro-Optics Europe and European Quantum Electronics Conference
  • OSA Technical Digest (Optica Publishing Group, 2021),
  • paper cm_2_2

Deep surface amorphization in silicon induced by spectrally-tuned ultrashort laser pulses

Mario Garcia-Lechuga, Noemi Casquero, Andong Wang, David Grojo, and Jan Siegel

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Abstract

Deep surface amorphization in silicon for telecom waveguide writing applications is achieved by tuning the femtosecond laser writing wavelength from 515nm-4000nm. Amorphous layers of 128 nm can be achieved, much exceeding the current 70 nm-limit.

© 2021 IEEE

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