Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • Conference on Lasers and Electro-Optics/Europe (CLEO/Europe 2023) and European Quantum Electronics Conference (EQEC 2023)
  • Technical Digest Series (Optica Publishing Group, 2023),
  • paper cb_11_1

GaAs-based wide-aperture single emitters with 68 W output power at 69% efficiency realized using a periodic buried-regrown-implant-structure

Not Accessible

Your library or personal account may give you access

Abstract

Increased optical output power Popt from single broad area GaAs-based diode lasers is demanded for material processing, with higher Popt and cost reduction in €/W enabled by using devices with ever-wider apertures [1]. Device structures suitable for single emitters with very large footprints (> 4 mm2) that sustain high Popt and conversion efficiency ηE without exciting unwanted optical modes (e.g. ring oscillations) are also of interest as an enabling technology for high power photonic crystal surface emitting lasers [2]. We report here progress in broad area diode lasers with resonator length L = 4 mm and emitting aperture of W = 1200 µm with wavelength λ = 915 nm. An ηE-optimized highly vertically asymmetric epitaxial design was used, taken from [3,4,5], and grown using metal organic vapor phase epitaxy (MOVPE). To suppress lateral (e.g. ring) oscillations, following [6], the lateral current path was patterned periodically, with 9 µm current blocking stripes on a 29 µm period. Here, the lateral pattern was realised with a buried-regrown-implant-structure, BRIS, following [3,4,5], see schematic in Fig. 1a. After the first growth the p-side cladding and waveguide layers of the laser are implanted with O+ ions to block current flow, periodically within the stripe, and broadly outside the stripe, then the wafer is regrown to complete the structure. In contrast to approaches based on etched p-n junctions [7], the wafer is still planar, minimizing growth defects, and lateral refractive index steps are minimized. Thick (800 nm) highly-doped p-type material was regrown after implantation. The residual thickness is dres ~ 600 nm (offset between current blocking and active region), sufficient to suppress 70…80% of lateral current spreading at the device edges [7]. After regrowth, single emitters lasers were fabricated using standard techniques, facet passivated (ZnSe) then coated for front and rear facet reflectivity of RF = 1.8% and RR = 98%. The devices were mounted with AuSn in a miniaturised (6 × 8 × 3.2 mm) CuW-sandwich package. Fig. 1b presents electro-optic characteristics at 25°C heatsink temperature, Popt is measured with a calibrated thermoelectric detector, in-pulse-power with a fast photodetector, voltage U in 4-terminal configuration and far field with a goniometer. In quasi-continuous wave QCW test (10 Hz, 500 µs), peak ηE = Popt / IU = 69% (current, I) at Popt = 68 W and ηE = 52% at Popt = 200 W are seen.

© 2023 IEEE

PDF Article
More Like This
High power CW 780 nm diode lasers for use in additive manufacturing

Seval Arslan, Paul Simon Basler, Ben King, Johannes Glaab, Andre Maaßdorf, Dominik Martin, Andrea Knigge, Arnim Ginolas, Sabrina Kreutzmann, and Paul Crump
cb_11_3 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2023

Carrier Non-pinning at Stripe Edges and Widened Far field in Broad-Area Lasers due to Longitudinal Temperature Variation

S. K. Khamari, S. Arslan, C. Zink, S. J. Sweeney, and P. Crump
SF1Q.3 CLEO: Science and Innovations (CLEO:S&I) 2023

Output Charaeteristics Of High Power GaAs/GaAlAs Double Heterostructure Rib-Waveguide Bow-tie Lasers

I. Middlemast, J. Sarma, and P.S. Spencer
IWF3 Integrated Photonics Research (IPR) 1996

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.