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Wafer-scale single-aperture near-infrared metalens fabricated by deep UV photolithography

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Abstract

We reported a wafer-scale near-infrared metalens with an aperture size of eight centimeters operating around 1.5 µm fabricated using deep UV photolithography. Our measurements show that it has diffraction-limited performance with about 80% focusing efficiency.

© 2022 The Author(s)

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