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Direct Imprinting of Porous Substrates

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Abstract

We present “direct imprinting of porous substrates” (DIPS) as a strategy for nanoscaled (<100nm) patterning of porous nanomaterials. DIPS is further investigated as a low-cost, high-throughput technique for fabricating optical structures with enhanced light-matter interaction.

© 2011 Optical Society of America

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